Dr. Subrata Ghosh
at Indian Institute of Technology Mandi
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Thin films, Lithography, Electron beam lithography, Atomic force microscopy, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist developing, Resolution enhancement technologies, Tin

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Thin films, Lithography, Electron beam lithography, Optical lithography, Electrons, Ions, Monte Carlo methods, Line width roughness, Helium, Line edge roughness

SPIE Journal Paper | October 16, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Extreme ultraviolet lithography, Polymers, Photoresist materials, Extreme ultraviolet, Electron beam lithography, Etching, Line edge roughness, Resistance, Silicon, Lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Thin films, Lithography, Electron beam lithography, Etching, Polymers, Silicon, Resistance, Surface roughness, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Electron beam lithography, Polymers, Silicon, Scanning electron microscopy, Polymerization, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Electron beam lithography, Etching, Polymers, Resistance, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

Showing 5 of 7 publications
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