Dr. Suchit Bhattarai
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Publications (9)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Energy efficiency, Scattering, Spectroscopy, Quantum efficiency, Chemistry, Electron microscopes, Scanning electron microscopy, Photoresist materials, Monte Carlo methods, Solids, Extreme ultraviolet, Extreme ultraviolet lithography, Ranging, Chemically amplified resists

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Data modeling, Scattering, Spectroscopy, Dielectrics, Electrons, Electron microscopes, Optical testing, Reflectometry, Solids, Extreme ultraviolet, Phonons, Reflectance spectroscopy, Absorption

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Point spread functions, Data modeling, Calibration, Photons, Extreme ultraviolet, Line edge roughness, Stochastic processes, Systems modeling, Quenching (fluorescence)

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Plasmons, Electron beam lithography, Spectroscopy, Photons, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Absorption

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Speckle, Scattering, Inspection, Atomic force microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Line edge roughness, Scatter measurement

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Coherence (optics), Image processing, Surface roughness, Image quality, Photomasks, Extreme ultraviolet, Line edge roughness, Semiconducting wafers, Stochastic processes, Ranging

Showing 5 of 9 publications
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