Dr. Sue Ryeon Kim
Principal Engineer at Samsung Electronics Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Multilayers, Etching, Metals, Reflectivity, Control systems, Line width roughness, Immersion lithography, Logic devices, Back end of line

Proceedings Article | 10 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Multilayers, Optical lithography, Etching, Interfaces, Silicon, Reflectivity, Control systems, Double patterning technology, Immersion lithography

Proceedings Article | 10 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Multilayers, Optical lithography, Etching, Metals, Reflectivity, Control systems, Line width roughness, Logic devices, Tin

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Reflection, Etching, Metals, Reflectivity, Line width roughness, Immersion lithography, Logic devices, Critical dimension metrology

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