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Suhong Kim
Research Assistant at Stanford Univ
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Publications (1)
Proceedings Article | 23 September 2002 Paper
Diode laser sensor to monitor HCL in a plasma etch reactor
Suhong Kim, Pete Klimecky, Shang-I Chou, Jay Jeffries, Fred Terry, Ronald Hanson
Proceedings Volume 4817, (2002) https://doi.org/10.1117/12.452073
KEYWORDS: Etching, Plasma, Plasma etching, Sensors, Chlorine, Semiconductor lasers, Absorption, Modulation, Anisotropic etching, Semiconducting wafers
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