Sukjong Bae
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Optical systems, Electron beams, Contamination, Error analysis, Image quality, Photomasks, Extreme ultraviolet, Double patterning technology, Mask making, Optimization (mathematics)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Electron beam lithography, Scattering, Monte Carlo methods, Photomasks, Extreme ultraviolet, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Astatine

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Electron beams, Curium, Etching, Ions, Chromium, Photomasks, Plasma etching, Critical dimension metrology, Photoresist processing, Information operations

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