Sunwook Jung
Principal Engineer at
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Optical lithography, Calibration, Etching, Metals, Machine learning, Optical proximity correction, Convolution, Statistical modeling, Mahalanobis distance

Proceedings Article | 28 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Visual process modeling, Visualization, Calibration, Etching, Error analysis, Feature extraction, Bridges, Extreme ultraviolet, Computational lithography, Nanoimprint lithography, Critical dimension metrology, Tolerancing, Process modeling, Process engineering, Instrument modeling

Proceedings Article | 28 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Cadmium, Data modeling, Etching, Metals, Image processing, 3D modeling, Optical proximity correction, Reactive ion etching, Semiconducting wafers, Back end of line

Proceedings Article | 17 March 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Semiconductors, Lithography, Calibration, Etching, 3D modeling, Photoresist materials, Optical proximity correction, Critical dimension metrology, Tolerancing, 3D image processing

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Oxides, Data modeling, Calibration, Reflectivity, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design

Proceedings Article | 29 March 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Target detection, Data modeling, Calibration, Error analysis, Manufacturing, Process control, Photomasks, Feedback loops, Critical dimension metrology, Process modeling

Showing 5 of 9 publications
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