Sung-Gyu Lee
at Hanyang Univ
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 22, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Multilayers, Image processing, Nickel, Computer simulations, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Tantalum, Semiconducting wafers

PROCEEDINGS ARTICLE | October 26, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Graphene, Pellicles, Finite element methods, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Refractive index, Deep ultraviolet, Polarization, Silicon, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Silica, Silicon, Manufacturing, Pellicles, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide, Ruthenium

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Cooling systems, Silicon, Hydrogen, Pellicles, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Convection, Radiation effects

SPIE Journal Paper | October 12, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing

Showing 5 of 9 publications
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