Dr. Sung-Hoon Jang
Student at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 5 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Reticles, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Model-based design, 193nm lithography

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Cadmium, Data modeling, Error analysis, Photomasks, Artificial intelligence, Optical proximity correction, Neodymium, Semiconducting wafers, Statistical modeling, Performance modeling

Proceedings Article | 4 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Statistical analysis, Data modeling, Error analysis, Neural networks, Photomasks, Artificial intelligence, Explosives, Data conversion, Statistical modeling, Neurons

Proceedings Article | 14 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Lithography, Manufacturing, Inspection, Control systems, Printing, Photomasks, SRAF, Mask making, Critical dimension metrology

Proceedings Article | 21 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Electronics, Error analysis, Manufacturing, Inspection, Photomasks, Optical proximity correction, SRAF, Data conversion, Resolution enhancement technologies, Defect inspection

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Electronics, Manufacturing, Distributed computing, Photomasks, Optical proximity correction, Local area networks, Data centers, Network architectures, Resolution enhancement technologies

Showing 5 of 12 publications
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