Dr. Sung-Hyuk Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (14)

Proceedings Article | 14 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Electron beam lithography, Etching, Manufacturing, Chromium, Photomasks, Optical simulations, Absorbance, Semiconducting wafers, Binary data

Proceedings Article | 27 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Optical lithography, Polarization, Image quality, Photomasks, Image enhancement, Immersion lithography, Binary data, Resolution enhancement technologies, Phase shifts

Proceedings Article | 22 March 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Mathematical modeling, Semiconductors, Lithography, Electronics, Optical lithography, Capillaries, Applied physics, Semiconducting wafers, Liquids, Chemically amplified resists

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Ellipsometry, Lithography, Air contamination, Electroluminescence, Pellicles, Spectroscopic ellipsometry, Transmittance, Photomasks, Critical dimension metrology

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Lithographic illumination, Scattering, Chromium, Electroluminescence, Photomasks, Optical proximity correction, Binary data, Resolution enhancement technologies, Phase shifts

Showing 5 of 14 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top