Sung-Won Kwon
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (6)

Proceedings Article | 16 October 2017 Presentation
Proceedings Volume 10451, 104510I (2017)
KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Inspection, Extreme ultraviolet lithography, High volume manufacturing, Scanners, Transmittance

Proceedings Article | 18 March 2015 Paper
Jinho Park, NamJae Kim, Jae-hyun Kang, Seung Weon Paek, Steve Kwon, Marwah Shafee, Kareem Madkour, Wael ElManhawy, Joe Kwan, Jean-Marie Brunet
Proceedings Volume 9427, 942703 (2015)
KEYWORDS: Phase modulation, Lithography, Image classification, Library classification systems, Visualization, Process modeling, Design for manufacturing, Manufacturing, Yield improvement, Land mines

Proceedings Article | 25 September 2010 Paper
Sung-Won Kwon, Dong-Chan Kim, Dong-Seok Nam, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume 7823, 78230F (2010)
KEYWORDS: Etching, Chromium, Plasma, Photomasks, Plasma etching, Oxygen, Chlorine, Dry etching, Emission spectroscopy, Mask making

Proceedings Article | 14 May 2007 Paper
Jong Gul Doh, Cheol Hong Park, Yong Seung Moon, Bo Hye Kim, Sung Won Kwon, Sun Young Choi, Sung Hyuck Kim, Seong Yoon Kim, Byung Gook Kim, Sang Gyun Woo, Han Ku Cho
Proceedings Volume 6607, 66071U (2007)
KEYWORDS: Photomasks, Binary data, Chromium, Etching, Absorbance, Lithography, Manufacturing, Semiconducting wafers, Optical simulations, Electron beam lithography

Proceedings Article | 20 May 2006 Paper
Sung-Won Kwon, Young-Ju Park, Sung-Yoon Kim, Han-shin Lee, Hyuk-Joo Kwon, Seung-Woon Choi, Woo-Sung Han
Proceedings Volume 6283, 62831T (2006)
KEYWORDS: Etching, Photomasks, Dry etching, Photoresist processing, Chlorine, Plasma etching, Chemistry, Critical dimension metrology, Plasma, Lead

Showing 5 of 6 publications
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