Mr. Sung-Won Kwon
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Scanners, Inspection, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Phase modulation, Visualization, Manufacturing, Design for manufacturing, Image classification, Yield improvement, Process modeling, Land mines, Library classification systems

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Etching, Dry etching, Chromium, Oxygen, Emission spectroscopy, Photomasks, Plasma etching, Mask making, Chlorine, Plasma

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Electron beam lithography, Etching, Manufacturing, Chromium, Photomasks, Optical simulations, Absorbance, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Etching, Dry etching, Chemistry, Photomasks, Plasma etching, Critical dimension metrology, Chlorine, Photoresist processing, Plasma, Lead

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Etching, Quartz, Ions, Surface roughness, Atomic force microscopy, Scanning electron microscopy, Photomasks, Fluorine, Plasma systems, Phase shifts

Showing 5 of 6 publications
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