Mr. Sunggon Jung
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Electronics, Image segmentation, Manufacturing, Electroluminescence, Inverse problems, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics)

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Data modeling, Calibration, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Calibration, Diffusion, Scanning electron microscopy, Photomasks, Cadmium sulfide, Optical proximity correction, SRAF, Critical dimension metrology, Performance modeling

PROCEEDINGS ARTICLE | May 26, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Electron beam lithography, Image segmentation, Manufacturing, Control systems, Photomasks, SRAF, Critical dimension metrology, Stereolithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Atrial fibrillation, Data modeling, Image segmentation, Scanners, Manufacturing, Printing, Photomasks, Optical proximity correction, Process modeling

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Optical lithography, Data modeling, Calibration, Scanners, Error analysis, Image filtering, Optical proximity correction, Performance modeling, Model-based design, Instrument modeling

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top