Sung Gon Jung
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (11)

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731L (2011)
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Data modeling, Lithography, SRAF, Calibration, Nanoimprint lithography, Resolution enhancement technologies

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731C (2011)
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Manufacturing, SRAF, Image segmentation, Inverse problems, Optimization (mathematics), Electronics, Electroluminescence

Proceedings Article | 29 September 2010 Paper
Proceedings Volume 7823, 782311 (2010)
KEYWORDS: SRAF, Optical proximity correction, Scanning electron microscopy, Calibration, Diffusion, Photomasks, Lithography, Performance modeling, Cadmium sulfide, Critical dimension metrology

Proceedings Article | 26 May 2010 Paper
Proceedings Volume 7748, 77481T (2010)
KEYWORDS: SRAF, Photomasks, Image segmentation, Lithography, Control systems, Stereolithography, Critical dimension metrology, Electron beam lithography, Manufacturing, Resolution enhancement technologies

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70280Y (2008)
KEYWORDS: Atrial fibrillation, Optical proximity correction, Printing, Photomasks, Manufacturing, Scanners, Image segmentation, Process modeling, Optical lithography, Data modeling

Showing 5 of 11 publications
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