Dr. Sungho Lee
at Samsung Advanced Institute of Technology
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Silicon, Manufacturing, Photomasks, Double patterning technology, Optical proximity correction

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Photovoltaics, Logic, Manufacturing, Photomasks, Image enhancement, Double patterning technology, Optical proximity correction, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Calibration, Etching, Metals, 3D modeling, Bridges, Design for manufacturing, Optical proximity correction, Optimization (mathematics), Process modeling

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Wafer-level optics, Data modeling, Polarization, Databases, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Statistical modeling, System on a chip, Instrument modeling

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical lithography, Calibration, Error analysis, Computer simulations, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Tolerancing, Process modeling

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Lithographic illumination, Control systems, Photomasks, SRAF, Critical dimension metrology, Semiconducting wafers, Tolerancing, Electromagnetism, Phase shifts

Showing 5 of 14 publications
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