Dr. Sungho Lee
at Samsung Advanced Institute of Technology
SPIE Involvement:
Publications (14)

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73791N (2009) https://doi.org/10.1117/12.824300
KEYWORDS: Double patterning technology, Optical proximity correction, Silicon, Optical lithography, Photomasks, Logic, Etching, Manufacturing, Metals, Lithography

Proceedings Article | 17 October 2008 Paper
Byung-Sung Kim, Yoo-Hyun Kim, Sung-Ho Lee, Sung-Il Kim, Sang-Rok Ha, Juhwan Kim, Alexander Tritchkov
Proceedings Volume 7122, 71220T (2008) https://doi.org/10.1117/12.801310
KEYWORDS: SRAF, Photomasks, Manufacturing, Optical proximity correction, Lithography, Photovoltaics, Semiconducting wafers, Double patterning technology, Image enhancement, Logic

Proceedings Article | 19 May 2008 Paper
No-Young Chung, Hee-Sang Bae, Beum-Seok Seo, Sung-Ho Lee, Sung-Il Kim, Sun-Yong Lee
Proceedings Volume 7028, 70283D (2008) https://doi.org/10.1117/12.793121
KEYWORDS: Process modeling, Design for manufacturing, Metals, 3D modeling, Optical lithography, Bridges, Optical proximity correction, Calibration, Optimization (mathematics), Etching

Proceedings Article | 30 October 2007 Paper
No-Young Chung, Woon-Hyuk Choi, Sung-Ho Lee, Sung-Il Kim, Sun-Yong Lee
Proceedings Volume 6730, 67302J (2007) https://doi.org/10.1117/12.746446
KEYWORDS: Optical proximity correction, Data modeling, Semiconducting wafers, Polarization, Databases, Wafer-level optics, Statistical modeling, System on a chip, Optimization (mathematics), Instrument modeling

Proceedings Article | 27 March 2007 Paper
Byung-Sung Kim, Sung-Ho Lee, Hong-Jae Shin, Nae-In Lee
Proceedings Volume 6520, 652027 (2007) https://doi.org/10.1117/12.711922
KEYWORDS: SRAF, Critical dimension metrology, Photomasks, Tolerancing, Lithography, Control systems, Semiconducting wafers, Lithographic illumination, Electromagnetism, Phase shifts

Showing 5 of 14 publications
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