Mr. Sunghyun Oh Profile

Sunghyun Oh

at SK Hynix Inc

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 23 October 2015 Paper

Novel CD control of HTPSM by advanced process for sub-20nm tech

Sangjin Jo, Chungseon Choi, Sunghyun Oh, Taejoong Ha, Sangpyo Kim, Donggyu Yim, Youngmo Lee

Proceedings Volume 9635, 96351T (2015) https://doi.org/10.1117/12.2196938

KEYWORDS: Critical dimension metrology, Etching, Chromium, Scanning electron microscopy, Photomasks, Transmission electron microscopy, Double patterning technology, Phase shifts, Image processing, Signal processing

Read Abstract +

Proceedings Article | 29 October 2014 Paper

A method of utilizing AIMS to quantify lithographic performance of high transmittance mask

Chun Seon Choi, Dong Sik Jang, Sung Hyun Oh, Jae Cheon Shin, Tae Joong Ha, Sang Pyo Kim, Dong Gyu Yim, Byungho Nam

Proceedings Volume 9235, 92351R (2014) https://doi.org/10.1117/12.2066283

KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Nanoimprint lithography, Lithography, Binary data, Chromium, Etching, Image analysis, Extreme ultraviolet

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Analysis of phase defect effect on contact hole pattern using a programmed phase defect in EUVL mask

Yongdae Kim, Tsuneo Terasawa, Tsuyoshi Amano, Sunghyun Oh, Yoonsuk Hyun, Hidehiro Watanabe

Proceedings Volume 9048, 90482Q (2014) https://doi.org/10.1117/12.2046571

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Extreme ultraviolet, Optical lithography, Phase measurement, Inspection, Erbium

Read Abstract +

Proceedings Article | 8 June 2010 Paper

Photomask defect detection and inspection: aerial imaging and high resolution inspection strategies

Aviram Tam, Yulian Wolff, Inpyo Kim, Michael Ben Yishai, DaeHo Hwang, Sunghyun Oh, Changreol Kim

Proceedings Volume 7748, 774827 (2010) https://doi.org/10.1117/12.869574

KEYWORDS: Inspection, Photomasks, SRAF, Defect detection, Image resolution, Critical dimension metrology, Airborne remote sensing, Artificial intelligence, Optics manufacturing, Signal detection

Read Abstract +

Proceedings Article | 19 May 2008 Paper

The study to optimize CD uniformity by reliable area CD measurement on 45nm D/R DRAM

Munsik Kim, Yongdae Kim, Sunghyun Oh, Changreol Kim, Yongkyoo Choi

Proceedings Volume 7028, 70281O (2008) https://doi.org/10.1117/12.793065

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Scanning electron microscopy, Transmittance, Spatial filters, Image filtering, Image enhancement, Image processing, Error analysis

Read Abstract +

Proceedings Article | 2 May 2008 Paper

Design of pattern-specific mask grating for giving the effect of an off-axis illumination

Se-Geun Park, El-Hang Lee, Yong Kyoo Choi, Sung Hyun Oh, Beom-Hoan O, Seung Gol Lee, Seok Ho Song, Jong Ung Lee, Munsik Kim, Young-Seok Kim

Proceedings Volume 6792, 67920R (2008) https://doi.org/10.1117/12.798809

KEYWORDS: Photomasks, Lithographic illumination, Optical design, Chromium, Lithography, Quartz, Atrial fibrillation

Read Abstract +

Proceedings Article | 21 March 2008 Paper

EUV mask inspection tool using high NA DUV inspection tool

Yongkyoo Choi, Sunghyun Oh, Yongdae Kim, Changreol Kim, Munsik Kim

Proceedings Volume 6921, 692123 (2008) https://doi.org/10.1117/12.773145

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Deep ultraviolet, Reflectivity, Defect inspection, Extreme ultraviolet lithography, EUV optics, Etching, Defect detection

Read Abstract +

Proceedings Article | 25 October 2007 Paper

Mask inspection method for 45nm node device

Yongkyoo Choi, Oscar Han, Goomin Jeong, Daeho Hwang, Sunghyun Oh

Proceedings Volume 6730, 673029 (2007) https://doi.org/10.1117/12.746864

KEYWORDS: Inspection, Photomasks, Reflectivity, Critical dimension metrology, Wafer-level optics, Pellicles, Light, Semiconducting wafers, Defect inspection, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 20 October 2006 Paper

CD measurement evaluation on periodic patterns between optic tools and CD-SEM

Oscar Han, Sunghyun Oh, Munsik Kim, Yongkyoo Choi

Proceedings Volume 6349, 63491N (2006) https://doi.org/10.1117/12.686461

KEYWORDS: Critical dimension metrology, Scatterometry, Photomasks, Scanning electron microscopy, Deep ultraviolet, Image enhancement, Metrology, Wafer-level optics, Transmittance, Calibration

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Multi-point CD measurement method to evaluate pattern fidelity and performance of mask

Oscar Han, Sunghyun Oh, Dongwook Lee, Munsik Kim, Kanjoon Seo, Hyemi Lee, Yongkyoo Choi

Proceedings Volume 6349, 634944 (2006) https://doi.org/10.1117/12.686473

KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Image filtering, Line edge roughness, Anisotropic filtering, Time metrology, Anisotropic diffusion, Scatterometry, Metrology

Read Abstract +

Showing 5 of 10 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years