Sunghyun Oh
at SK Hynix Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Image processing, Chromium, Scanning electron microscopy, Transmission electron microscopy, Signal processing, Photomasks, Double patterning technology, Critical dimension metrology, Phase shifts

Proceedings Article | 29 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Etching, Chromium, Image analysis, Transmittance, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Binary data

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Optical lithography, Inspection, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Erbium, Extreme ultraviolet lithography, Phase measurement, Semiconducting wafers

Proceedings Article | 8 June 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Defect detection, Inspection, Image resolution, Photomasks, Artificial intelligence, SRAF, Critical dimension metrology, Signal detection, Optics manufacturing, Airborne remote sensing

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Spatial filters, Image processing, Error analysis, Scanning electron microscopy, Image filtering, Transmittance, Photomasks, Image enhancement, Critical dimension metrology, Semiconducting wafers

Showing 5 of 10 publications
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