Sunghyun Oh
at SK Hynix Inc
SPIE Involvement:
Publications (10)

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Critical dimension metrology, Etching, Chromium, Scanning electron microscopy, Photomasks, Transmission electron microscopy, Double patterning technology, Phase shifts, Image processing, Signal processing

Proceedings Article | 29 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Nanoimprint lithography, Lithography, Binary data, Chromium, Etching, Image analysis, Extreme ultraviolet

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Extreme ultraviolet, Optical lithography, Phase measurement, Inspection, Erbium

Proceedings Article | 8 June 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Inspection, Photomasks, SRAF, Defect detection, Image resolution, Critical dimension metrology, Airborne remote sensing, Artificial intelligence, Optics manufacturing, Signal detection

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Scanning electron microscopy, Transmittance, Spatial filters, Image filtering, Image enhancement, Image processing, Error analysis

Showing 5 of 10 publications
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