Sungjin Kim
Engineer at Hynix Semiconductor Inc
SPIE Involvement:
Profile Summary

OPC Engineer (MEMORY)
Publications (6)

Proceedings Article | 18 March 2015 Paper
Seongjin Kim, Munhoe Do, Yongbae An, Jaeseung Choi, Hyunjo Yang, Donggyu Yim
Proceedings Volume 9426, 94261X (2015)
KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Photomasks, Model-based design, Resolution enhancement technologies, Semiconducting wafers, Logic devices, Current controlled current source, Logic

Proceedings Article | 16 April 2011 Paper
Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Byounghoon Lee, Jongsik Bang, Hyunkyung Shim, Sungjin Kim, James Moon, Donggyu Yim, Sung-Ki Park
Proceedings Volume 7972, 79720P (2011)
KEYWORDS: Optical lithography, Photomasks, Critical dimension metrology, Nanoimprint lithography, Chromium, Etching, Double patterning technology, Scanners, Image processing, Photoresist developing

Proceedings Article | 2 April 2010 Paper
Dae Jong Kim, Hyung Won Yoo, Chul Hong Kim, Hak Kwon Lee, Sung Su Kim, Koon Ho Bae, Hedvi Spielberg, Yun Ho Lee, Shimon Levi, Yariv Bustan, Moshe Rozentsvige
Proceedings Volume 7638, 76380B (2010)
KEYWORDS: Semiconducting wafers, Polarization, Line edge roughness, Critical dimension metrology, Wafer inspection, Process control, Metrology, Photomasks, Light scattering, Semiconductors

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63492T (2006)
KEYWORDS: Air contamination, Photomasks, Critical dimension metrology, Transmittance, Spectroscopic ellipsometry, Lithography, Electroluminescence, Ellipsometry, Semiconductors, Pellicles

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61524B (2006)
KEYWORDS: Air contamination, Photomasks, Transmittance, Critical dimension metrology, Spectroscopic ellipsometry, Ellipsometry, Reticles, Phase shifts, Binary data, Lithography

Showing 5 of 6 publications
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