Sungjin Kim
Engineer at Hynix Semiconductor Inc
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OPC Engineer (MEMORY)
Publications (6)

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Photomasks, Model-based design, Resolution enhancement technologies, Semiconducting wafers, Logic devices, Current controlled current source, Logic

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Photomasks, Critical dimension metrology, Nanoimprint lithography, Chromium, Etching, Double patterning technology, Scanners, Image processing, Photoresist developing

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconducting wafers, Polarization, Line edge roughness, Critical dimension metrology, Wafer inspection, Process control, Metrology, Photomasks, Light scattering, Semiconductors

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Air contamination, Photomasks, Critical dimension metrology, Transmittance, Spectroscopic ellipsometry, Lithography, Electroluminescence, Ellipsometry, Semiconductors, Pellicles

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Air contamination, Photomasks, Transmittance, Critical dimension metrology, Spectroscopic ellipsometry, Ellipsometry, Reticles, Phase shifts, Binary data, Lithography

Showing 5 of 6 publications
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