Sungjin Kim
Engineer at Hynix Semiconductor Inc
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OPC Engineer (MEMORY)
Publications (6)

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Logic, Optical lithography, Photomasks, Logic devices, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies, Current controlled current source

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Etching, Image processing, Scanners, Chromium, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Photoresist developing

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Metrology, Polarization, Light scattering, Process control, Wafer inspection, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Ellipsometry, Lithography, Air contamination, Electroluminescence, Pellicles, Spectroscopic ellipsometry, Transmittance, Photomasks, Critical dimension metrology

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Ellipsometry, Lithography, Reticles, Air contamination, Spectroscopic ellipsometry, Transmittance, Photomasks, Critical dimension metrology, Binary data, Phase shifts

Showing 5 of 6 publications
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