Mr. Sungmin Huh
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (27)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Data modeling, Calibration, Inspection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Inspection, Transmission electron microscopy, Printing, Software development, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Semiconductors, Lithography, Scanners, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Semiconductors, Defect detection, Inspection, Photomasks, Extreme ultraviolet, Bismuth, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 26, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Defect detection, Particles, Manufacturing, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

SPIE Journal Paper | October 1, 2010
JM3 Vol. 9 Issue 04
KEYWORDS: Line width roughness, Extreme ultraviolet, Charge-coupled devices, Photomasks, Reticles, Extreme ultraviolet lithography, Microscopes, Inspection, Microscopy, Scanning electron microscopy

Showing 5 of 27 publications
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