Dr. Sungsoo Suh
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (23)

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Calibration, Etching, Control systems, Scanning electron microscopy, Photomasks, Transistors, Critical dimension metrology, Performance modeling, Personal protective equipment, Instrument modeling

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Electronics, Image segmentation, Manufacturing, Electroluminescence, Inverse problems, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics)

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Data modeling, Calibration, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 26, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Electron beam lithography, Image segmentation, Manufacturing, Control systems, Photomasks, SRAF, Critical dimension metrology, Stereolithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Image segmentation, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 9, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Logic, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Systems modeling, Model-based design

Showing 5 of 23 publications
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