Sungtae Kim
at Ultratech Korea
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Oxides, Lithography, Metrology, Data modeling, Manufacturing, Inspection, Interferometry, Distortion, Process control, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top