Sunil Srinivasan
Sales Representative at Oerlikon USA Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Etching, Ions, Chromium, Control systems, Photomasks, Critical dimension metrology, Binary data, Plasma

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Etching, Quartz, Dry etching, Chemistry, Chromium, Scanning electron microscopy, Photomasks, Photoresist processing, Plasma, Phase shifts

PROCEEDINGS ARTICLE | January 22, 2005
Proc. SPIE. 5715, Micromachining and Microfabrication Process Technology X
KEYWORDS: Microelectromechanical systems, Oxides, Etching, Ions, Silicon, Multiplexing, Time division multiplexing, Semiconducting wafers, Plasma, High aspect ratio silicon micromachining

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Etching, Quartz, Dry etching, Manufacturing, Surface roughness, Scanning electron microscopy, Photomasks, Reactive ion etching, Phase shifts

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