Sunkeun Ji
at SK Hynix Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Metrology, Defect detection, Databases, Etching, Inspection, Control systems, Distortion, Optical testing, Overlay metrology, Chemical mechanical planarization, Defect inspection

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Optical lithography, Imaging systems, Etching, Error analysis, Distortion, Double patterning technology, Semiconducting wafers, Overlay metrology, Data analysis

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Metals, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Data processing, Computer aided design, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Metrology, Metals, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

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