Jang-Sun Sunny Kim
Prof Svcs Cons at KLA Corp
SPIE Involvement:
Area of Expertise:
Overlay control , Machine learning , Metrology , CD control , Data science
Profile Summary

Lithography Scanners : Canon, Nikon and ASML system
Co-optimization : Overlay to Alignment, CD to Leveling & Dose
Metrology and Mark design : DBO, SCOL, Focus, Cell overlay
Device Integration and Yield Engineering - DRAM / FLASH
Semiconductor Manufacturing Systems – APC control, Machine learning, Scanner diagnostic system
Publications (7)

Proceedings Article | 23 March 2020 Paper
Jangsun Kim, Seonho Lee, Hyunjun Ha, Boris Habets, Enrico Bellmann, Holger Bald, Tobias Hoeer, Seop Kim
Proceedings Volume 11327, 113270V (2020) https://doi.org/10.1117/12.2552735
KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Neodymium, Computer simulations, Data modeling, Yield improvement, Electronics, Information technology, Standards development

Proceedings Article | 26 March 2019 Paper
Jang-Sun Kim, Jin-Moo Byun, Remco Lancee, Jong-Hyun Hwang, Hyeon-Jun Ha, Kwang-Young Hu, Se-Ra Jeon, Won-Jae Jang, Hyung-Sub Son, Vidar van der Meijden, Marc Noot, Bartosz Foltynski, Lukasz Macht, Grzegorz Grzela, Cedric Grouwstra
Proceedings Volume 10959, 109592M (2019) https://doi.org/10.1117/12.2514931
KEYWORDS: Overlay metrology, Metrology, Front end of line, Yield improvement, Control systems, Scatterometry

SPIE Journal Paper | 29 March 2016
Young Seog Kang, Cedric Affentauschegg, Jan Mulkens, Jang-Sun Kim, Ju Hee Shin, Young Ha Kim, YoungSun Nam, Young-Sin Choi, Hunhwan Ha, Dong-Han Lee, Jae-il Lee, Umar Rizvi, Bernd Geh, Rob van der Heijden, Jan Baselmans, Oh-Sung Kwon
JM3, Vol. 15, Issue 02, 021403, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021403
KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks

Proceedings Article | 18 March 2015 Paper
Young-Sun Nam, Sunny Kim, Ju Hee Shin, Young Sin Choi, Sang Ho Yun, Young Hoon Kim, Si Woo Shin, Jeong Heung Kong, Young Seog Kang, Hun Hwan Ha
Proceedings Volume 9426, 942612 (2015) https://doi.org/10.1117/12.2087196
KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Diffraction, Target detection, Error analysis, Scanning electron microscopy, Statistical analysis, Manufacturing, Scanners

Proceedings Article | 18 March 2015 Paper
Young-Seog Kang, Hunhwan Ha, Jang-Sun Kim, Ju Hee Shin, Young Ha Kim, Young Sun Nam, Young-Sin Choi, Cedric Affentauschegg, Rob van der Heijden, Umar Rizvi, Bernd Geh, Eric Janda, Jan Baselmans, Stefan van der Sanden, Oh-Sung Kwon, Mariya Ponomarenko, Daan Slotboom
Proceedings Volume 9426, 942608 (2015) https://doi.org/10.1117/12.2086938
KEYWORDS: Overlay metrology, Distortion, Etching, Metrology, Image processing, Instrument modeling, Data modeling, Calibration, Photomasks, Measurement devices

Showing 5 of 7 publications
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