Sunyoung Koo
Technical Staff/Researcher at SK Hynix Inc
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 5 May 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Optical lithography, Contamination, Lithographic illumination, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Nanoimprint lithography, Stray light, Stochastic processes, Fiber optic illuminators

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Resolution enhancement technologies

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Optical lithography, Ultraviolet radiation, Ions, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Line edge roughness, Neodymium

Proceedings Article | 6 April 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Reticles, Scanners, Particles, Inspection, Scanning electron microscopy, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Metrology, Liquid phase epitaxy, Etching, Error analysis, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Critical dimension metrology, Stochastic processes

Showing 5 of 18 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top