Dr. Suresh Lakkapragada
Self Employed at KLA Corp
SPIE Involvement:
Publications (8)

Proceedings Article | 5 October 2016 Paper
George Hwa, Raj Bugata, Kaiming Chiang, Suresh Lakkapragada, Vikram Tolani, Sandhya Gopalakrishnan, Chun-Jen Chen, Chin-Ting Yang, Sheng-Chang Hsu, Laurent Tuo
Proceedings Volume 9985, 99851Z (2016) https://doi.org/10.1117/12.2241482
KEYWORDS: Photomasks, Reticles, Inspection, Metrology, Defect inspection, Manufacturing, Semiconducting wafers, Databases, Computing systems, Operating systems

Proceedings Article | 1 October 2013 Paper
Crystal Wang, Steven Ho, Eric Guo, Kechang Wang, Suresh Lakkapragada, Jiao Yu, Peter Hu, Vikram Tolani, Linyong Pang
Proceedings Volume 8880, 88800C (2013) https://doi.org/10.1117/12.2030844
KEYWORDS: Inspection, Photomasks, Defect inspection, Defect detection, Classification systems, Image classification, Image resolution, Manufacturing, Resolution enhancement technologies, SRAF

Proceedings Article | 20 September 2013 Paper
T. Yen, Rick Lai, Laurent Tuo, Vikram Tolani, Dongxue Chen, Peter Hu, Jiao Yu, George Hwa, Yan Zheng, Suresh Lakkapragada, Kechang Wang, Danping Peng, Bill Wang, Kaiming Chiang
Proceedings Volume 8880, 88800A (2013) https://doi.org/10.1117/12.2031786
KEYWORDS: Inspection, Reticles, Photomasks, Semiconducting wafers, Contamination, Air contamination, Optical proximity correction, Scanners, Defect inspection, Visualization

Proceedings Article | 8 November 2012 Paper
Vikram Tolani, Grace Dai, Suresh Lakkapragada, Peter Hu, Kechang Wang, Lin He, Ying Li, Danping Peng, George Hwa, Linyong Pang
Proceedings Volume 8522, 85221O (2012) https://doi.org/10.1117/12.977138
KEYWORDS: Inspection, Reticles, Photomasks, Semiconducting wafers, Image processing, Air contamination, Resolution enhancement technologies, Defect detection, Image restoration, Scanners

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61522I (2006) https://doi.org/10.1117/12.656447
KEYWORDS: Critical dimension metrology, Atomic force microscopy, Spectroscopic ellipsometry, Metrology, Lithography, Photoresist materials, Signal processing, Photomasks, Optics manufacturing, Optical testing

Showing 5 of 8 publications
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