Suresh Lakkapragada
Self Employed at KLA Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photomasks, Reticles, Inspection, Metrology, Defect inspection, Manufacturing, Semiconducting wafers, Databases, Computing systems, Operating systems

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Inspection, Photomasks, Defect inspection, Defect detection, Classification systems, Image classification, Image resolution, Manufacturing, Resolution enhancement technologies, SRAF

Proceedings Article | 20 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Inspection, Reticles, Photomasks, Semiconducting wafers, Contamination, Air contamination, Optical proximity correction, Scanners, Defect inspection, Visualization

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Inspection, Reticles, Photomasks, Semiconducting wafers, Image processing, Air contamination, Resolution enhancement technologies, Defect detection, Image restoration, Scanners

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Critical dimension metrology, Atomic force microscopy, Spectroscopic ellipsometry, Metrology, Lithography, Photoresist materials, Signal processing, Photomasks, Optics manufacturing, Optical testing

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Etching, Metrology, Critical dimension metrology, Transistors, Spectroscopic ellipsometry, Process control, Semiconducting wafers, Oxides, Control systems, Semiconductors

Showing 5 of 8 publications
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