Ms. Susan S. MacDonald Profile

Susan S. MacDonald

Senior Applications Engineer at Photronics Inc

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Author

Publications (15)

Proceedings Article | 2 April 2014

Improved reticle requalification accuracy and efficiency via simulation-powered automated defect classification

Shazad Paracha, Benjamin Eynon, Ben Noyes, Anthony Nhiev, Anthony Vacca, Peter Fiekowsky, Dan Fiekowsky, Young Mog Ham, Doug Uzzel, Michael Green, Susan MacDonald, John Morgan

Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII

KEYWORDS: Reticles, Defect detection, Error analysis, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Wafer testing, Classification systems

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Proceedings Article | 21 March 2006

Printability of quartz defects in a production Cr-less mask process

Gregory Hughes, Susan MacDonald, John Riddick, Anthony Nhiev, Jason Hickethier

Proc. SPIE. 6154, Optical Microlithography XIX

KEYWORDS: Lithography, Etching, Quartz, Inspection, Chromium, Scanning electron microscopy, Printing, Photomasks, Semiconducting wafers, Phase shifts

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Proceedings Article | 9 November 2005

Design and fabrication of nano-imprint templates using unique pattern transforms and primitives

Susan MacDonald, David Mellenthin, Kevin Rentzsch, Kenneth Kramer, James Ellenson, Tim Hostetler, Ron Enck

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Microelectromechanical systems, Lithography, Electron beam lithography, Manufacturing, Transform theory, Photomasks, Nanoimprint lithography, Semiconducting wafers, Optics manufacturing, Vestigial sideband modulation

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Proceedings Article | 8 November 2005

Design and fabrication of highly complex topographic nano-imprint template for dual Damascene full 3-D imprinting

Susan MacDonald, Greg Hughes, Michael Stewart, Frank Palmieri, C. Grant Willson

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Optical lithography, Etching, Quartz, Metals, Copper, Dielectrics, Manufacturing, Photomasks, Semiconducting wafers

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Proceedings Article | 12 May 2005

A novel mask-based approach to improve low-k1 corner and angle definition in alternating-aperture phase-shift mask structures

Kent Nakagawa, David Siefers, Susan MacDonald, Peter Buck

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Neck, Quartz, Manufacturing, Magnetism, Distortion, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Phase shifts

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Proceedings Article | 12 May 2005

Imaging study of positive and negative tone weak phase-shifted 65 nm node contacts

James Beach, John Petersen, Robert Greenway, Mark Maslow, Susan MacDonald, Lee Margolis, Gregory Hughes

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Lithography, Reticles, Etching, Quartz, Manufacturing, Photomasks, Nanoimprint lithography, Critical dimension metrology, Vestigial sideband modulation, Phase shifts

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Proceedings Article | 10 May 2005

Advanced mask metrology enabling characterization of imprint lithography templates

L. Myron, Liraz Gershtein, Gidi Gottlieb, Bob Burkhardt, Andrew Griffiths, David Mellenthin, Kevin Rentzsch, Susan MacDonald, Greg Hughes

Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX

KEYWORDS: Lithography, Metrology, Cadmium, Etching, Quartz, Chromium, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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Proceedings Article | 20 August 2004

The study of phase angle effects to wafer process window using 193-nm EAPSM in a 300-mm wafer manufacturing environment

William Chou, Shih Yen, J. Wu, W. Shieh, Mars Chuang, George Fan, Chin Chih Tseng, Gregory Hughes, Susan MacDonald, Carrie Holiday, Gong Chen

Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI

KEYWORDS: Lithography, Etching, Quartz, Scanners, Computer simulations, Printing, Photomasks, Semiconducting wafers, Wafer manufacturing, 193nm lithography

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Proceedings Article | 28 May 2004

Study of OPC for AAPSM reticles using various mask fabrication techniques

Gregory Hughes, Denny Kamaruddin, Kent Nakagawa, Susan MacDonald, Bill Wilkinson, Craig West, Keuntaek Park

Proc. SPIE. 5377, Optical Microlithography XVII

KEYWORDS: Reticles, Data modeling, Etching, Chromium, Image analysis, Photomasks, Optical proximity correction, Mask making, Photoemission spectroscopy, Semiconducting wafers

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Proceedings Article | 24 May 2004

Qualification of a low-cost high-quality reticle process for 90-nm contact layers

Kirk Strozewski, Joe Perez, Rusty Carter, Robert Kiefer, Curt Jackson, Susan MacDonald, Franklin Kalk

Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII

KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Reticles, Optical lithography, Deep ultraviolet, Inspection, Photomasks, Mask making, Semiconducting wafers

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Proceedings Article | 10 July 2003

Design-to-process integration: optimizing 130-nm X architecture manufacturing

Robert Dean, Vinod Malhotra, Nahid King, Michael Sanie, Susan MacDonald, James Jordan, Shigeru Hirukawa

Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing

KEYWORDS: Lithography, Reticles, Metals, Silicon, Manufacturing, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 30 July 2002

Aberration determination in early 157-nm exposure system

Bruce Smith, Will Conley, Cesar Garza, Jeff Meute, Daniel Miller, Georgia Rich, Victoria Graffenberg, Kim Dean, Shashikant Patel, Arnie Ford, James Foster, Marco Moers, Kevin Cummings, James Webb, Paul Dewa, Azeddine Zerrade, Susan MacDonald, Greg Hughes, Peter Dirksen

Proc. SPIE. 4691, Optical Microlithography XV

KEYWORDS: Lithography, Monochromatic aberrations, Edge detection, Imaging systems, Image processing, Manufacturing, Wavefronts, Scanning electron microscopy, Zernike polynomials, Photomasks

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Proceedings Article | 11 March 2002

Verification of the effect of mask bias on the mask error enhancement factor of contact holes

Michael Reilly, Stewart Robertson, Colin Parker, Doris Kang, Mircea Dusa, Susan MacDonald, Craig West

Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology

KEYWORDS: Metrology, Optical testing, Scanning electron microscopy, Image quality, Photomasks, Image enhancement, Nanoimprint lithography, Semiconducting wafers, Binary data, Phase shifts

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Proceedings Article | 14 September 2001

Binary halftone chromeless PSM technology for quarter-lambda optical lithography

J. Fung Chen, John Petersen, Robert Socha, Thomas Laidig, Kurt Wampler, Kent Nakagawa, Greg Hughes, Susan MacDonald, Waiman Ng

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Lithography, Reticles, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Mask making, Halftones, Binary data

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Proceedings Article | 5 July 2000

OPC beyond 0.18 mm: OPC on PSM gates

Franklin Schellenberg, Olivier Toublan, Nicolas Cobb, Emile Sahouria, Greg Hughes, Susan MacDonald, Craig West

Proc. SPIE. 4000, Optical Microlithography XIII

KEYWORDS: Lithography, Reticles, Phase shifting, Etching, Manufacturing, Photomasks, Optical proximity correction, Phase measurement, Semiconducting wafers, Phase shifts

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Showing 5 of 15 publications

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