Susanne M. Pepper
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Refractive index, Deep ultraviolet, Sensors, Computer simulations, Photoresist materials, Refraction, Semiconducting wafers, Temperature metrology, Liquids

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