Sushil S. Sakhare
at IMEC
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Photovoltaics, Logic, Optical lithography, Electrodes, Metals, Gallium arsenide, Diffusion, Manufacturing, Transistors, Field effect transistors, CMOS technology, Extreme ultraviolet lithography, Design for manufacturability, Nanowires

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Optical lithography, Nano opto mechanical systems, Metals, Scanners, Reliability, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Resistance, Extreme ultraviolet, Transistors, Field effect transistors, Extreme ultraviolet lithography, Standards development

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Argon, Metals, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Computational lithography

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