Dr. Susumu Iida
Senior Researcher at EIDEC
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Susumu Iida received his BS and MS degrees in 1995 and 1997, respectively; and later in 2000 he earned his Ph.D. in electronics, all from the Shizuoka University, Japan. He joined the Research and Development Center, Toshiba Corporation, where he carried out research on GaN based blue laser diode. In 2006, he was assigned to AMiT (Advanced Mask Inspection Technology Corporation), where he carried out the development of light source and optics of DUV defect inspection tools. In 2011, he was assigned to EIDEC, and since then he has been engaged in the development of patterned mask inspection.
Publications (28)

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Imaging systems, Sensors, Image processing, Inspection, Electron microscopes, Image sensors, Photomasks, Extreme ultraviolet lithography, Defect inspection

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Oxides, Multilayers, Metrology, Contamination, Defect detection, Metals, Crystals, Inspection, Monte Carlo methods, Image quality, Photomasks, Extreme ultraviolet, Selenium, Ruthenium

SPIE Journal Paper | March 22, 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Inspection, Scanning electron microscopy, Defect detection, Extreme ultraviolet, Line edge roughness, Image processing, Image resolution, Ultraviolet detectors, Photomasks, Electron microscopes

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Microscopes, Multilayers, Reflectivity, Image quality

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Defect detection, Detection and tracking algorithms, Image processing, Inspection, Electron microscopes, Optical inspection, Image sensors, Data processing, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Signal detection

SPIE Journal Paper | March 8, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Inspection, Photomasks, Defect detection, Image sensors, Extreme ultraviolet lithography, Signal detection, Sensors, Defect inspection, Image processing, Image resolution

Showing 5 of 28 publications
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