CONFERENCE PROCEEDINGS
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Sven Boese
at Qoniac GmbH
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 28 April 2023 Poster + Paper
Focus spot monitoring: design of an automatable detection, classification, and impact analysis pipeline
Philip Groeger, Syed Naime Mohammad, Sven Boese, Holger Bald, Alberto Lopez-Gomez, Clemens Utzny, Stefan Buhl
Proceedings Volume 12494, 1249416 (2023) https://doi.org/10.1117/12.2657970
KEYWORDS: Semiconducting wafers, Lithography, Zernike polynomials, Particles, Optical lithography, Semiconductor manufacturing, Modeling, Design and modelling, Scanners, Yield improvement
Proceedings Article | 27 April 2023 Presentation + Paper
Quantifying CD-SEM contact hole roughness and shape combined with machine learning-based pattern fidelity scores for process optimization and monitoring
Hyosung Lee, Hyungju Rah, Iksun Park, Jaeil Lee, Jaewoong Sohn, Yongchan Kim, Kang-san Lee, Philip Groeger, Sven Boese, Enrico Bellmann, Stefan Buhl, Seop Kim, Seonho Lee, Christoph Ehrlich
Proceedings Volume 12496, 124961P (2023) https://doi.org/10.1117/12.2657679
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Image processing, Image restoration, Education and training, Contour extraction, Machine learning, Deformation, Finite element methods
Proceedings Article | 26 May 2022 Poster + Paper
Machine learning modeling using process context and exposure data for overlay prediction
W. H. Wang, Irina Brinster, Mohsen Maniat, Yen-Hui Lee, C. F. Tseng, Wei-Yuan Chu, Fatima Anis, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Sven Boese, Boris Habets
Proceedings Volume 12053, 120531Q (2022) https://doi.org/10.1117/12.2613202
KEYWORDS: Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Optical parametric oscillators, Performance modeling, Process modeling, Machine learning, Semiconductor manufacturing, Data processing
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