Dr. Sven E. Henrichs
Senior Technologist at Intel Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 29 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Multilayers, Metrology, Etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Defect inspection

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Cadmium, Scanning electron microscopy, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Binary data

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Optical lithography, Manufacturing, Design for manufacturing, Photomasks, Data conversion, Neodymium, Tolerancing, Overlay metrology, Phase shifts

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Cadmium, Etching, Quartz, Atomic force microscopy, Scanning electron microscopy, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Reticles, Logic, Optical lithography, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Phase shifts

Showing 5 of 7 publications
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