Sven Ploeger
at HOLOEYE Photonics AG
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | April 27, 2016
Proc. SPIE. 9888, Micro-Optics 2016
KEYWORDS: Fabrication, Carbon, Lithography, Electron beam lithography, Diffraction, Beam splitters, Diffractive optical elements, Silica, Etching, Glasses, Silicon, Scanning electron microscopy, Micro optics, Optical resolution, Photomasks, Integrated optics, Reactive ion etching, Precision glass molding

PROCEEDINGS ARTICLE | September 24, 2015
Proc. SPIE. 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V
KEYWORDS: Carbon, Beam splitters, Diffractive optical elements, Etching, Glasses, Silicon, Optical fabrication, Reactive ion etching, Semiconducting wafers, Precision glass molding

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
KEYWORDS: Carbon, Titanium, Diffractive optical elements, Silica, Etching, Glasses, Photomasks, Reactive ion etching, Power meters, Precision glass molding

PROCEEDINGS ARTICLE | May 20, 2009
Proc. SPIE. 7358, Holography: Advances and Modern Trends
KEYWORDS: Holograms, Holography, 3D image reconstruction, Image processing, Image resolution, Phase shift keying, Computer generated holography, Image transmission, Information security, Holography applications

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Mirrors, Multilayers, Polarization, Sensors, Reflectivity, Polarimetry, Reflectometry, Diodes, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Multilayers, Metrology, Polarization, Sensors, Reflectivity, Reflectometry, Diodes, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

Showing 5 of 8 publications
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