Dr. Syarhei M. Avakaw
Director at KBTEM-OMO JSC
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Prisms, Reticles, Defect detection, Opacity, Sensors, Databases, Inspection, Inspection equipment, Photomasks, Laser systems engineering

PROCEEDINGS ARTICLE | June 21, 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Reticles, Optical lithography, Defect detection, Error analysis, Inspection, Distance measurement, Photomasks, Dynamical systems, Factor analysis, Edge roughness

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Reticles, Optical lithography, Defect detection, Error analysis, Inspection, Distance measurement, Photomasks, Dynamical systems, Factor analysis, Edge roughness

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Defect detection, Detection and tracking algorithms, Sensors, Databases, Image processing, Inspection, Image transmission, Photomasks, Algorithm development

PROCEEDINGS ARTICLE | June 16, 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Defect detection, Detection and tracking algorithms, Data modeling, Databases, Image processing, Inspection, Image enhancement, Algorithm development

PROCEEDINGS ARTICLE | June 2, 2004
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Reticles, Defect detection, Image processing, Inspection, Image acquisition, Image analysis, Optical alignment, Algorithm development, Halftones, Systems modeling

Showing 5 of 7 publications
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