Syed A. Rizvi
Retired at NECS
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | July 1, 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Semiconductors, Lithography, Chemical species, Particles, Molecules, Crystals, Electrons, Silicon, Quantum dots, Photomasks

PROCEEDINGS ARTICLE | June 14, 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Silicon, Manufacturing, Surface roughness, Diagnostics, Atomic force microscopy, Image quality, Atomic force microscope, Mask making, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | June 14, 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Reticles, Metrology, Statistical analysis, Cadmium, Calibration, Wavelets, Error analysis, Fourier transforms, Critical dimension metrology, Tolerancing

PROCEEDINGS ARTICLE | December 18, 1998
Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Wafer-level optics, Reticles, Metrology, Calibration, Manufacturing, Image quality, Photomasks, Semiconducting wafers, Tolerancing, Optics manufacturing

PROCEEDINGS ARTICLE | September 1, 1998
Proc. SPIE. 3412, Photomask and X-Ray Mask Technology V
KEYWORDS: Lithography, Diffraction, Reticles, Etching, Quartz, Photomasks, Optical proximity correction, Phase measurement, Anisotropic etching, Phase shifts

PROCEEDINGS ARTICLE | June 5, 1998
Proc. SPIE. 3331, Emerging Lithographic Technologies II
KEYWORDS: Semiconductors, Lithography, Manufacturing, Distortion, Photomasks, Critical dimension metrology, Manufacturing equipment, Semiconducting wafers, Tolerancing, Overlay metrology

Showing 5 of 8 publications
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