Syed A. Rizvi
Retired
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 1 July 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Semiconductors, Lithography, Chemical species, Particles, Molecules, Crystals, Electrons, Silicon, Quantum dots, Photomasks

Proceedings Article | 14 June 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Silicon, Manufacturing, Surface roughness, Diagnostics, Atomic force microscopy, Image quality, Atomic force microscope, Mask making, Semiconducting wafers, Phase shifts

Proceedings Article | 14 June 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Reticles, Metrology, Statistical analysis, Cadmium, Calibration, Wavelets, Error analysis, Fourier transforms, Critical dimension metrology, Tolerancing

Proceedings Article | 18 December 1998
Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Wafer-level optics, Reticles, Metrology, Calibration, Manufacturing, Image quality, Photomasks, Semiconducting wafers, Tolerancing, Optics manufacturing

Proceedings Article | 1 September 1998
Proc. SPIE. 3412, Photomask and X-Ray Mask Technology V
KEYWORDS: Lithography, Diffraction, Reticles, Etching, Quartz, Photomasks, Optical proximity correction, Phase measurement, Anisotropic etching, Phase shifts

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top