Sylvain G. Muckenhirn
President at Iris Versicolor Corp.
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Optical imaging, Image visualization, Polarization, Visualization, Graphene, Sensors, Microscopy, Silicon, Coating, Image resolution, Atomic force microscopy, Image sensors, Precision measurement, Process control, Nanomaterials, Nanobiotechnology, DNA nanotechnology, Nano coatings, Carbon nanotubes

PROCEEDINGS ARTICLE | July 10, 2003
Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing
KEYWORDS: Metrology, Optical lithography, Image processing, Manufacturing, Diagnostics, Process control, Dimensional metrology, Critical dimension metrology, Semiconducting wafers, Edge roughness

PROCEEDINGS ARTICLE | August 22, 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Surface roughness, Atomic force microscopy, Scanning electron microscopy, Servomechanisms, Atomic force microscope, Semiconductor manufacturing, Scanning probe microscopy, Line edge roughness, Edge roughness, Scanning probe microscopes

PROCEEDINGS ARTICLE | August 22, 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Etching, Quartz, Capillaries, Silicon, Chromium, Photomasks, Scanning probe microscopy, Computer aided design, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | August 22, 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Semiconductors, Metrology, Etching, Manufacturing, Control systems, Semiconductor manufacturing, Scanning probe microscopy, Critical dimension metrology, Edge roughness, Scanning probe microscopes

PROCEEDINGS ARTICLE | June 14, 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Metrology, Pattern recognition, Manufacturing, Nondestructive evaluation, Atomic force microscopy, Process control, Microelectronics, Critical dimension metrology, Algorithm development, Semiconducting wafers

Showing 5 of 8 publications
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