Dr. Sylvia Pas
Photomask Technologist at
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Reticles, Contamination, Crystals, Ions, Inspection, Raman spectroscopy, Photomasks, Chemical analysis, Fluorine

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Reticles, Statistical analysis, Data modeling, Crystals, Inspection, Photomasks, Semiconducting wafers, Failure analysis, 193nm lithography

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Reticles, Contamination, Air contamination, Crystals, Ions, Manufacturing, Inspection, Photomasks, Chemical analysis, Fluorine

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