Takaya Matsushita
at Toshiba Corp
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 17, 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Optical lithography, Silica, Etching, Dry etching, Silicon, Scanning electron microscopy, Photomasks, Double patterning technology, Critical dimension metrology, Plasma

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