Tokio Nishita
at Nissan Chemical Industries Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Etching, Manufacturing, Photomasks, Extreme ultraviolet, Line width roughness, Directed self assembly, Extreme ultraviolet lithography, Photoresist processing, System on a chip, Overlay metrology

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Optical lithography, Contamination, Deep ultraviolet, Chemical species, Transmittance, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Thin film coatings

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