Mr. Toru Fujimori
Manager at FUJIFILM Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Contamination, Metals, Germanium, Silicon, Hydrogen, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Chemical elements, Zirconium

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Metals, Silicon, Chemistry, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, System on a chip, Standards development, Chemically amplified resists

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Imaging systems, Scanners, Silicon, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Digital signal processing, Optical lithography, Polymers, Capillaries, Photoresist materials, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist developing

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Electron beams, Contamination, Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Semiconducting wafers, Standards development, Temperature metrology

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Mirrors, Contamination, Data modeling, Scanners, Spectroscopy, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Systems modeling, EUV optics

Showing 5 of 6 publications
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