Toru Fujimori
Manager at FUJIFILM Corp
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Materials processing, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Stochastic processes, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Polymers, Photons, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films, Absorption

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Contamination, Metals, Chemistry, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Absorption

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Metals, Silicon, Chemistry, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, System on a chip, Standards development, Chemically amplified resists

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Contamination, Metals, Germanium, Silicon, Hydrogen, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Chemical elements, Zirconium

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Imaging systems, Scanners, Silicon, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Standards development

Showing 5 of 12 publications
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