Toru Fujimori
Manager at FUJIFILM Corp
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Stochastic processes, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Materials processing, Manufacturing, Photoresist processing, Absorption, Chemically amplified resists

Proceedings Article | 12 October 2018 Presentation
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Materials processing, Absorption, Lithography, Photoresist processing, Manufacturing, Line width roughness, Stochastic processes, Chemically amplified resists

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Absorption, Polymers, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Lithography, Polymer thin films, Semiconducting wafers, Photons

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Lithography, Chemistry, Metals, Line width roughness, Absorption, Stochastic processes, Contamination

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Contamination, Extreme ultraviolet, Extreme ultraviolet lithography, Metals, Hydrogen, Chemical elements, Mirrors, Reflectivity, Zirconium, Aluminum, Silicon, Germanium

Showing 5 of 13 publications
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