Toshiya Asano
at Canon Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 26 August 2024 Paper
Proceedings Volume 13177, 1317709 (2024) https://doi.org/10.1117/12.3032446
KEYWORDS: Nanoimprint lithography, Artificial intelligence, Lithography, Overlay metrology, Metrology, Optical lithography, Data modeling, Manufacturing, Computer simulations, Semiconducting wafers

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12954, 129540Z (2024) https://doi.org/10.1117/12.3009839
KEYWORDS: Nanoimprint lithography, Artificial intelligence, Lithography, Metrology, Computer simulations

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12495, 124950N (2023) https://doi.org/10.1117/12.2657058
KEYWORDS: Nanoimprint lithography, Optical lithography, Ultraviolet radiation, Physics, Performance modeling, Nanotechnology, Manufacturing equipment, Manufacturing, Lithography, Device simulation

SPIE Journal Paper | 4 January 2022
JM3, Vol. 21, Issue 01, 011005, (January 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.011005
KEYWORDS: Nanoimprint lithography, Photoresist processing, Computer simulations, Distortion, Manufacturing, Head, Solids, Optical lithography, High volume manufacturing, Resistance

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11610, 1161007 (2021) https://doi.org/10.1117/12.2584720
KEYWORDS: Nanoimprint lithography, Manufacturing, Computational lithography, Semiconductors, Semiconductor manufacturing, Optical lithography, Semiconducting wafers, Photomasks, Ultraviolet radiation, Physics

Showing 5 of 11 publications
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