Dr. Tab Stephens
Senior Member of Technical Staff
SPIE Involvement:
Publications (4)

Proceedings Article | 5 April 2007 Paper
Mark Caldwell, Tianming Bao, John Hackenberg, Brian McLain, Omar Munoz, Tab Stephens, Victor Vartanian
Proceedings Volume 6518, 65181L (2007) https://doi.org/10.1117/12.708813
KEYWORDS: Atomic force microscopy, Etching, Critical dimension metrology, 3D metrology, Metrology, Copper, Semiconducting wafers, Scanning electron microscopy, Process control, Transmission electron microscopy

Proceedings Article | 4 May 2005 Paper
Richard Peters, Patrick Montgomery, Cesar Garza, Stanley Filipiak, Tab Stephens, Dan Babbitt
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599918
KEYWORDS: Photoresist processing, Cadmium sulfide, Fluorine, Optical lithography, Thermal effects, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Polymers, Semiconductors

Proceedings Article | 12 June 2003 Paper
Richard Peters, Sergei Postnikov, Jonathan Cobb, S. Dakshina-Murthy, Tab Stephens, Colita Parker, Eric Luckowski, Arturo Martinez, Wei Wu, Scott Hector
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485122
KEYWORDS: Photoresist processing, Transistors, Etching, Semiconducting wafers, Plasma etching, Plasma, Silicon, Resistance, Defect inspection, Optical lithography

Proceedings Article | 12 June 2003 Paper
Jonathan Cobb, Shahid Rauf, Aaron Thean, S. Dakshina-Murthy, Tab Stephens, Colita Parker, Richard Peters, Vivek Rao
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485169
KEYWORDS: Line edge roughness, Etching, 3D modeling, Diffusion, Process modeling, Instrument modeling, Photoresist processing, Photoresist materials, Edge roughness, Image processing

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