Dr. Tab Stephens
Senior Member of Technical Staff
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Etching, Copper, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Process control, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Semiconductors, Optical lithography, Polymers, Scanning electron microscopy, Thermal effects, Cadmium sulfide, Critical dimension metrology, Fluorine, Photoresist processing, Semiconducting wafers

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Optical lithography, Etching, Silicon, Resistance, Transistors, Plasma etching, Photoresist processing, Semiconducting wafers, Plasma, Defect inspection

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Etching, Image processing, Diffusion, 3D modeling, Photoresist materials, Line edge roughness, Photoresist processing, Process modeling, Edge roughness, Instrument modeling

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