Tadahiko Takikawa
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Defect detection, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Lithography, Data modeling, Modulation, Scattering, Calibration, Ions, Manufacturing, Electroluminescence, Photomasks, Extreme ultraviolet

Proceedings Article | 16 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Manufacturing, Inspection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, EUV optics, Defect inspection

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Defect detection, Opacity, Particles, Manufacturing, Inspection, Electronic components, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optics manufacturing, Mask cleaning, EUV optics, Defect inspection

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Defect detection, Opacity, Inspection, Scanning electron microscopy, Optical inspection, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

Showing 5 of 22 publications
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