Tadao Yasuzato
Engineer at Micron Memory Japan Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Monochromatic aberrations, Scanners, Inspection, Control systems, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 25 August 1999
Proc. SPIE. 3748, Photomask and X-Ray Mask Technology VI
KEYWORDS: Lithography, Etching, Quartz, Light scattering, Photomasks, Mask making, Critical dimension metrology, Destructive interference, Binary data, Phase shifts

Proceedings Article | 1 September 1998
Proc. SPIE. 3412, Photomask and X-Ray Mask Technology V
KEYWORDS: Lithography, Defect detection, Dry etching, Photography, Manufacturing, Inspection, Photomasks, Excimer lasers, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 July 1997
Proc. SPIE. 3096, Photomask and X-Ray Mask Technology IV
KEYWORDS: Lithography, Lithographic illumination, Scattering, Etching, Quartz, Light scattering, Photomasks, Excimer lasers, Semiconducting wafers, Phase shifts

Proceedings Article | 7 July 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Lithography, Monochromatic aberrations, Photomasks, Excimer lasers, Optical proximity correction, Phase shifts

Proceedings Article | 24 July 1996
Proc. SPIE. 2793, Photomask and X-Ray Mask Technology III
KEYWORDS: Lithography, Lithographic illumination, Opacity, Printing, Transmittance, Photomasks, Mask making, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Showing 5 of 10 publications
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