Tadashi Arai
at Canon Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Logic, Optical lithography, Etching, Transmission electron microscopy, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, Neodymium, Semiconducting wafers

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Photovoltaics, Metals, Inspection, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Lithographic illumination, Computer programming, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography, Binary data

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Composites, Manufacturing, Photomasks, Logic devices, Source mask optimization, Optical proximity correction

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Polarization, Wavefront aberrations, Distortion, Laser induced plasma spectroscopy, Projection systems, Double patterning technology, Overlay metrology

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top