Tadashi Hatanaka
at Nissan Chemical Industries Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Oxides, Thin films, Reflection, Etching, Silicon, Reflectivity, Photoresist materials, Plasma etching, Semiconducting wafers, Bottom antireflective coatings

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Ions, Silicon, Coating, Reflectivity, Doping, Photoresist materials, Photomasks, Semiconducting wafers, Photoresist developing, Bottom antireflective coatings

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