Mr. Tadashi Kitamura
at NGR Inc
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Semiconductors, Lithography, Defect detection, Inspection, Scanning electron microscopy, Optical inspection, Bridges, Optical proximity correction, Semiconducting wafers, Design for manufacturability

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Carbon, Metrology, Coating, Scanning electron microscopy, Optical inspection, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tin, Defect inspection

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Optical design, Statistical analysis, Error analysis, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Computer aided design, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Metrology, Error analysis, Inspection, Electron microscopes, Distortion, Scanning electron microscopy, Optical inspection, Photomasks, Optical proximity correction, Critical dimension metrology

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Logic, Defect detection, Silica, Databases, Metals, Inspection, Chromium, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Edge detection, Defect detection, Inspection, Design for manufacturing, Photomasks, Optical proximity correction, Computer aided design, Critical dimension metrology, Semiconducting wafers

Showing 5 of 7 publications
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