Mr. Tadashi Kotsugi Profile

Tadashi Kotsugi

at Tokyo Electron Ltd

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Proceedings Article | 20 March 2008 Paper

Shaped beam technique using a novel 3rd-order imaging approach

Tadashi Kotsugi, Takashi Fuse, Hidetoshi Kinoshita, N. William Parker

Proceedings Volume 6921, 69211V (2008) https://doi.org/10.1117/12.771753

KEYWORDS: Beam shaping, Semiconducting wafers, Electron beam direct write lithography, Objectives, Monochromatic aberrations, Solids, Electron beams, Ray tracing, Image processing, Silicon

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We investigate a new technique for high current density beam formation called 3rd order imaging. This technique has two advantages: 1) increasing the beam current without beam blurring, and 2) producing a desired beam shape, such as a square or rectangle. Thus, it can significantly decrease writing times in Electron Beam Direct Writing (EBDW). These advantages are realized by using a patterned beam-defining aperture (PBDA) whose patterned openings work with the spherical aberration in the objective lens to generate the final beam shape. The PBDA transmits rays if they fall within the desired shape at the wafer, while blocking rays which would fall outside the desired shape. We have obtained beam line profiles and two-dimensional beam shapes experimentally. The 3rd-order imaging beam current density is seven times larger than that of a beam shaped by the conventional aperture. The experimental beam profile and the calculated result are in good agreement. The experimental two-dimensional shapes reproduce the calculated beam shapes, thereby verifying the theory of 3rd-order imaging. This technique is a potential solution to break through the technological impasse of high current density versus high resolution.

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