Tadashi Miyagi
at SCREEN Holdings Co Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithium, Video, Silicon, Coating, Photoresist materials, High speed cameras, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Content addressable memory

Proceedings Article | 19 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Wafer-level optics, Image processing, Scanning electron microscopy, Bridges, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Metrology, Coating, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 27 March 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Cameras, Image processing, Video, Coating, Scanning electron microscopy, High speed cameras, Extreme ultraviolet, Thin film coatings, Semiconducting wafers, Content addressable memory

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Defect detection, Coating, Scanning electron microscopy, Bridges, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Showing 5 of 11 publications
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